Publications

• Hongquan He, Guowen Kuang, Qi Sun, Hao Geng$^\dagger$.
  PoLM: Point Cloud and Large Pre-trained Model Catch Mixed-type Wafer Defect Pattern Recognition.
  IEEE/ACM Proceedings Design, Automation and Test in Europe (DATE), Valencia, Spain, Mar. 25–27, 2024.

• Zhen Wang$^$, Hongquan He$^*$, Tao Wu, Xuming He, Qi Sun, Cheng Zhuo, Bei Yu, Jingyi Yu$^\dagger$, Hao Geng$^\dagger$.
  LMLitho: A Large Vision Model-Driven Lithography Simulation Framework.
  *IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Munich, Oct. 26–30, 2025.

• Guojin Chen, Hongquan He, Peng Xu, Hao Geng, Bei Yu$^\dagger$.
  Effcient Bilevel Source Mask Optimization.
  IEEE/ACM Proceedings Design Automation Conference (DAC), San Francisco, Jun. 23–27, 2024.

• Kai Ma, Zhen Wang, Hongquan He, Qi Xu, Tinghuan Chen, Hao Geng$^\dagger$.
  LMM-IR: Large-Scale Netlist-Aware Multi-modal Framework for Static IR-Drop Prediction.
  IEEE/ACM Design Automation Conference (DAC), San Francisco, Jun. 22–25, 2025.

$^*$Equal contribution
$^\dagger$Corresponding author.